Hostname: page-component-cd9895bd7-hc48f Total loading time: 0 Render date: 2024-12-25T13:48:57.833Z Has data issue: false hasContentIssue false

Single and dual ion implantation of c:Si with Fe+ and C+: microstructural characterization

Published online by Cambridge University Press:  10 September 2015

B. Nunes*
Affiliation:
Departamento de BioEngenharia and Centro de Química Estrutural, Instituto Superior Técnico, University of Lisbon, Av. Rovisco Pais, 1049-001 Lisboa, PORTUGAL
E. Alves
Affiliation:
Campus Tecnológico e Nuclear, IPFN, Instituto Superior Técnico, University of Lisbon, EN10, 2695-066 Bobadela LRS, PORTUGAL
R. Colaço
Affiliation:
Departamento de BioEngenharia and Centro de Química Estrutural, Instituto Superior Técnico, University of Lisbon, Av. Rovisco Pais, 1049-001 Lisboa, PORTUGAL

Abstract

Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Material Sciences
Copyright
Copyright © Microscopy Society of America 2015 

References

[1]Bhusan, Bharat, Microelectronic Engineering 84, 387, 2007.CrossRefGoogle Scholar
[2]Luo, J., et al, Journal of Micromechanics and Microengineering 17, S147, 2007.CrossRefGoogle Scholar
[3]Patton, S.T., et al, Tribology International 35, 373, 2002.CrossRefGoogle Scholar