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SEM Imaging of Resist Patterns Fabricated Through Imprint Lithography Techniques

Published online by Cambridge University Press:  01 August 2010

C Schamp ,
BT Valdez ,
LK Ballast ,
A Gill ,
SA Pierce ,
L Brown ,
C Brooks ,
E Thompson  and
B Roth
C Schamp
Affiliation:
Cerium Labs
BT Valdez
Affiliation:
Cerium Labs
LK Ballast
Affiliation:
Cerium Labs
A Gill
Affiliation:
Cerium Labs
SA Pierce
Affiliation:
Cerium Labs
L Brown
Affiliation:
Molecular Imprints
C Brooks
Affiliation:
Molecular Imprints
E Thompson
Affiliation:
Molecular Imprints
B Roth
Affiliation:
Hitachi High Technologies of America

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 628 - 629
Copyright
Copyright © Microscopy Society of America 2010