Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-27T03:50:25.108Z Has data issue: false hasContentIssue false

Segregation of Silicon in Metal-Alumina Composites

Published online by Cambridge University Press:  02 July 2020

R.Y. Hashimoto
Affiliation:
Center for Mat. Sci. & Eng., Dept. of mech. Eng., Naval Postgraduate School, Monterey, CA93943
E.S.K. Menon
Affiliation:
Center for Mat. Sci. & Eng., Dept. of mech. Eng., Naval Postgraduate School, Monterey, CA93943
A.G. Fox
Affiliation:
Center for Mat. Sci. & Eng., Dept. of mech. Eng., Naval Postgraduate School, Monterey, CA93943
Get access

Extract

A common impurity in polycrystalline commercial alumina is Si since silica is often added as a sintering aid. There have been several studies on impurities in alumina, and substantial degree of grain boundary segregation has been found to occur. Alumina-metal composites have found several applications especially in the electronic industry and consequently systems such as alumina-copper have been studied exhaustively. However, the role of impurities in metal-alumina composites has not been fully explored. Studies of Pt-alumina composites has shown that silicon is present at the interface of vacuum, diffusion bonded samples. Our earlier studies have shown that Si indeed segregates to the triple junctions and grain boundaries in alumina and in alumina-copper composites, often Si segregates to the metal-ceramic interfaces as well. This investigation concentrates on the distribution of silicon in copper-alumina in comparison to aluminum-alumina composites.

The metal-ceramic composites were prepared by diffusion bonding 99.99% pure metal foils sandwiched in between commercially available sintered alumina (∼99.5% pure) substrates for several hours in vacuum.

Type
Compositional Imaging and Spectroscopy
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

l.Kingery, W.D., Pure Appl. Chem. 56 (1984) 1703–14.CrossRefGoogle Scholar
2.Tomsia, A.P., J. de Physique IV, Colloque C7, 3 (1993) 1317–76.Google Scholar
3.Hashimoto, R., et.al Boundaries and Interfaces in Materials, Eds Pond, R.C., et.al TMS, (1998) 161-166.Google Scholar
4.Dalgleish, B.J., et.alScripta Metall. Mater. 31 (1994) 1109.CrossRefGoogle Scholar