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Reduction of Electron Beam Induced Specimen Contaminations by Chemical Cleaning of a TEM Column Using Oxygen Plasma

Published online by Cambridge University Press:  03 August 2008

S Horiuchi ,
T Hanada  and
M Ebisawa
S Horiuchi
Affiliation:
AIST, Japan
T Hanada
Affiliation:
Consult Zeroloss Imaging, Japan
M Ebisawa
Affiliation:
Consult Zeroloss Imaging, Japan
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Type
Research Article
Information
Microscopy and Microanalysis , Volume 14 , Supplement S2 , August 2008 , pp. 820 - 821
Copyright
© 2008 Microscopy Society of America

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