Hostname: page-component-586b7cd67f-r5fsc Total loading time: 0 Render date: 2024-11-23T10:42:25.138Z Has data issue: false hasContentIssue false

“Real-World” Microanalytical Tools for Accelerated Alloy Development

Published online by Cambridge University Press:  02 July 2020

Ernest L. Hall*
Affiliation:
General Electric Corporate Research and Development, Niskayuna, New York12309
Get access

Abstract

Conventional microanalytical tools, particularly analytical electron microscopy (AEM), electron probe microanalysis (EPMA), and powder x-ray diffraction (XRD), have been traditionally used in the development of new engineering alloys to determine the identity of phases in new materials, their composition, phase equilibria, and the subsequent effect on properties. Recently, there has been a growing effort in industry to reduce the cycle time (and lower the cost) associated with new material development. This is particularly true for the advanced alloys needed for high-temperature components in power generation and aerospace application. This has led first to the development of more rapid screening methodologies, such as combinatorial approaches, where a large number of compositions can be evaluated in parallel, or the diffusion multiple method, where multi-component phase space is investigated in a single experiment. These new approaches require new analysis tools that can rapidly assess crystal structure and composition in automated fashion.

Type
Microscopy in the Real World: Alloys and Other Materials
Copyright
Copyright © Microscopy Society of America 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Xiang, X.-D., Annual Rev. Mater. Sci. 29 (1999) 149.CrossRefGoogle Scholar

2. Zhao, J. C., Adv. Eng. Materials 3 (2001) to be published.Google Scholar

3. Bewlay, B. P. and Sutliff, J. A., Microscopy and Microanalysis 4 (Suppl 2: Proceedings) (1998) 278.CrossRefGoogle Scholar

4. The author acknowledges: John Sutliff for EBSP development, Bernard Bewlay for the silicide application, Charles Mukira for the μ-XRF application, and Yan Gao for the μ-XRF and μ-XRD development.Google Scholar