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Quantitative EFTEM of Cr Grain Boundary Segregation in Cocrta

Published online by Cambridge University Press:  02 July 2020

J.E. Wittig ,
J.F. Al-Sharab ,
J. Bentley ,
N.D. Evans ,
T.P. Nolan  and
R. Sinclair
J.E. Wittig
Affiliation:
Dept. of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN
J.F. Al-Sharab
Affiliation:
Dept. of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN
J. Bentley
Affiliation:
Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, , TN
N.D. Evans
Affiliation:
Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, , TN
T.P. Nolan
Affiliation:
Formerly of Komag Inc., , San Jose, CA
R. Sinclair
Affiliation:
Dept. of Materials Science and Eng., Stanford University, Palo Alto, CA
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Abstract

Grain boundary Cr segregation provides magnetic isolation between the crystals in sputtered Co thin films used for longitudinal magnetic recording. Magnetic isolation decouples individual grains in order to increase coercivity, lower media noise, and allow for higher recording densities. These sputtered Co alloys grow with a strong [1120] texture owing to a body centered cubic (BCC) Cr underlayer. The sputtered Cr seed-layer has a [001]BCC growth texture and the BCC {110}cr planes lattice match with the hexagonal (0002)cr planes. This produces the desired condition of the easy axis of magnetization, [0001]co, in the plane of the magnetic layer. However, since two orthogonal orientations of the {110}cr planes exist parallel to the [001]cr growth direction, it is possible to nucleate two hexagonal Co grains with orthogonal variants of the c-axis that will impinge to form a 90° grain boundary. The well defined crystallographic texture of the Co-alloy thin film with random angle and 90° grain boundaries presents an opportunity to study the effects of boundary character on Cr segregation in hexagonal crystals.

Type
Quantitative Transmission Electron Microscopy of Interfaces (Organized by M. Rüehle, Y. Zhu and U. Dahmen)
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 298 - 299
Copyright
Copyright © Microscopy Society of America 2001

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References

References:

1.Wittig, J.E., Nolan, T.P., Ross, CA., Schabes, M.E., Tang, K., Sinclair, R., Bentley, J., IEEE Transactions on Magnetics, 34: (4) (1998) 1564CrossRefGoogle Scholar
2.Bentley, J., Proc. Ann. Microsc. Microanal. Meeting, 6 (2000) 1186CrossRefGoogle Scholar
3.The research at the ORNL SHaRE User Facility was sponsored by the Division of Materials Sciences and Engineering, U.S. Department of Energy, under contract DE-AC05-00OR22725 with UT-Battelle, LLC and through the SHaRE Program under contract DE-AC05-76OR00033 with Oak Ridge Associated Universities.Google Scholar