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Ptychographic Imaging in an Aberration Corrected STEM

Published online by Cambridge University Press:  23 September 2015

Andrew R. Lupini ,
Miaofang Chi ,
Sergei V. Kalinin ,
Albina Y. Borisevich ,
Juan Carlos Idrobo  and
Stephen Jesse
Andrew R. Lupini
Affiliation:
Materials Science & Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Miaofang Chi
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Sergei V. Kalinin
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Albina Y. Borisevich
Affiliation:
Materials Science & Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Juan Carlos Idrobo
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831
Stephen Jesse
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 1219 - 1220
Copyright
Copyright © Microscopy Society of America 2015 

References

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[2] Shibata, N., et al, Nature Physics 8 (2012), p 611.Google Scholar
[3] Ishikawa, R., et al, Nature Materials 10 (2011), p 278.Google Scholar
[4] Pennycook, T.J., et al, Ultramicroscopy (2014), in press.Google Scholar
[5] Milazzo, A.-C., et al, Ultramicroscopy 104 (2005), p 152.Google Scholar
[6] Jesse, S., et al, these proceedings.Google Scholar
[7] Research supported by Division of Materials Sciences and Engineering Division, Office of Basic Energy Sciences, U.S. DOE (ARL, AYB) and by Oak Ridge National Laboratory's Center for Nanophase Materials Sciences (CNMS), which is sponsored by the Scientific User Facilities Division, Office of Basic Energy Sciences, U.S. Department of Energy (MC, SVK, JCI, SJ). The authors acknowledge technical assistance from Liang Jin and Benjamin Bammes of Direct Electron, and Hans Christen and Christianne Beekman for providing samples.Google Scholar