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Practical Measurement of X-ray Detection Performance of Large-Angle Silicon Drift Detectors Toward Quantitative Analysis in the Newly Developed 300 kV Aberration-Corrected Grand ARM

Published online by Cambridge University Press:  23 September 2015

M. Watanabe ,
T. Sasaki ,
Y. Jimbo ,
E. Okunishi  and
H. Sawada
M. Watanabe
Affiliation:
Dept of Materials Science and Engineering, Lehigh University, Bethlehem. PA 18015
T. Sasaki
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, 196-8558, Japan
Y. Jimbo
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, 196-8558, Japan
E. Okunishi
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, 196-8558, Japan
H. Sawada
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, 196-8558, Japan

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 1223 - 1224
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Egerton, R.F. & Cheng, S.C., Ultramicrosc 55 (1994) 43.Google Scholar
[2] The author (MW) wishes to acknowledge financial support from the NSF through grants DMR-0804528 and DMR-1040229.Google Scholar