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Polyallylamine as an Adhesion Promoter for SU-8 Photoresist

Published online by Cambridge University Press:  17 October 2016

Shiladitya Chatterjee ,
George H. Major ,
Barry M. Lunt ,
Massoud Kaykhaii  and
Matthew R. Linford
Shiladitya Chatterjee
Affiliation:
Department of Chemistry and Biochemistry, Brigham Young University, Provo, UT 84602, USA
George H. Major
Affiliation:
Department of Chemistry and Biochemistry, Brigham Young University, Provo, UT 84602, USA
Barry M. Lunt
Affiliation:
Department of Information Technology, Brigham Young University, Provo, UT 84602, USA
Massoud Kaykhaii
Affiliation:
Department of Chemistry and Biochemistry, Brigham Young University, Provo, UT 84602, USA
Matthew R. Linford*
Affiliation:
Department of Chemistry and Biochemistry, Brigham Young University, Provo, UT 84602, USA
*
*Corresponding author.[email protected]
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Abstract

Resist lithography is an important microfabrication technique in the electronics industry. In this, patterns are transferred by irradiation onto a photosensitive polymer. SU-8 has emerged as a favorite photoresist for High Aspect Ratio (HAR) lithography, showing high chemical and mechanical stability and biocompatibility. Unfortunately, its poor adhesion to substrates is a drawback, with possible solutions being the use of low-viscosity SU-8, surface modification with a low molecular weight adsorbate like hexamethyldisilazane (HMDS), or a commercial adhesion promotion reagent. However, HMDS and the commercial reagent require surface dehydration and/or curing, and a modified form of SU-8 is not always desirable. Here, we demonstrate the use of a water-soluble, amine-containing polymer, polyallylamine (PAAm), which spontaneously adsorbs to silica surfaces, as a simple, easy-to-apply, and reactive adhesion promoter for SU-8. Conditions for the use of PAAm are explored, and the resulting materials are characterized by X-ray photoelectron spectroscopy (XPS), spectroscopic ellipsometry (SE), and wetting.

Keywords

SU-8photoresistadhesionpolyallylamine
Type
Instrumentation and Techniques Development
Information
Microscopy and Microanalysis , Volume 22 , Issue 5 , October 2016 , pp. 964 - 970
Copyright
© Microscopy Society of America 2016 

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References

Balslev, S., Jorgensen, A.M., Bilenberg, B., Mogensen, K.B., Snakenborg, D., Geschke, O., Kutter, J.P. & Kristensen, A. (2006). Lab-on-a-chip with integrated optical transducers. Lab Chip 6(2), 213–217.Google Scholar
Brunner, T.A. (2003). Why optical lithography will live forever. J Vac Sci Technol B 21(6), 2632–2637.Google Scholar
Carballo, V.M.B., Melai, J., Salm, C. & Schmitz, J. (2009). Moisture resistance of SU-8 and KMPR as structural material. Microelectron Eng 86(4–6), 765–768.Google Scholar
Carlier, J., Arscott, S., Thomy, V., Fourrier, J.C., Caron, F., Camart, J.C., Druon, C. & Tabourier, P. (2004). Integrated microfluidics based on multi-layered SU-8 for mass spectrometry analysis. J Micromech Microeng 14(4), 619–624.Google Scholar
Chia, K.K., Cohen, R.E. & Rubner, M.F. (2008). Amine-rich polyelectrolyte multilayer nanoreactors for in situ gold nanoparticle synthesis. Chem Mater 20(21), 6756–6763.Google Scholar
Conradie, E.H. & Moore, D.F. (2002). SU-8 thick photoresist processing as a functional material for MEMS applications. J Micromech Microeng 12(4), 368–374.CrossRefGoogle Scholar
Dai, W., Lian, K. & Wang, W.J. (2005). A quantitative study on the adhesion property of cured SU-8 on various metallic surfaces. Microsyst Technol 11(7), 526–534.Google Scholar
del Campo, A. & Greiner, C. (2007). SU-8: A photoresist for high-aspect-ratio and 3D submicron lithography. J Micromech Microeng 17(6), R81–R95.Google Scholar
Djakov, T.A., Popovic, I.G. & Rajakovic, L.V. (2014). Micro-electro-mechanical systems (Mems)—technology for the 21st century. Hem Ind 68(5), 629–641.Google Scholar
Gates, B.D., Xu, Q.B., Stewart, M., Ryan, D., Willson, C.G. & Whitesides, G.M. (2005). New approaches to nanofabrication: Molding, printing, and other techniques. Chem Rev 105(4), 1171–1196.Google Scholar
Geim, A.K., Dubonos, S.V., Grigorieva, I.V., Novoselov, K.S., Zhukov, A.A. & Shapoval, S.Y. (2003). Microfabricated adhesive mimicking gecko foot-hair. Nat Mater 2(7), 461–463.Google Scholar
Golander, C.G. & Eriksson, J.C. (1987). Esca studies of the adsorption of polyethyleneimine and glutaraldehyde-reacted polyethyleneimine on polyethylene and mica surfaces. J Colloid Interface Sci 119(1), 38–48.Google Scholar
Gupta, V., Ganegoda, H., Engelhard, M.H., Terry, J. & Linford, M.R.(2014). Assigning oxidation states to organic compounds via predictions from X-ray photoelectron spectroscopy: A discussion of approaches and recommended improvements. J Chem Educ 91(2), 232–238.Google Scholar
Gutierrez-Rivera, L.E. & Cescato, L. (2008). SU-8 submicrometric sieves recorded by UV interference lithography. J Micromech Microeng 18(11), 115003.Google Scholar
Hung, C.H., Wiest, L.A., Singh, B., Diwan, A., Valentim, M.J.C., Christensen, J.M., Davis, R.C., Miles, A.J., Jensen, D.S., Vail, M.A., Dadson, A.E. & Linford, M.R. (2013). Improved efficiency of reversed-phase carbon/nanodiamond/polymer core-shell particles for HPLC using carbonized poly(divinylbenzene) microspheres as the core materials. J Sep Sci 36(24), 3821–3829.Google Scholar
Jin, M.H., Feng, X.J., Feng, L., Sun, T.L., Zhai, J., Li, T.J. & Jiang, L. (2005). Superhydrophobic aligned polystyrene nanotube films with high adhesive force. Adv Mater 17(16), 1977–1981.Google Scholar
Kim, S.M., Ku, S.J. & Kim, J.B. (2010). SiO2 nanodot arrays using functionalized block copolymer templates and selective silylation. Nanotechnology 21(23), 235302.Google Scholar
Kuchimaru, T., Sato, F., Aoi, Y., Fujita, T., Ikeda, T., Shimizu, K., Kato, Y. & Iida, T. (2008). Microchamber arrays for the identification of individual cells exposed to an X-ray microbeam. Radiat Environ Biophys 47(4), 535–540.Google Scholar
Kwon, J., Trivedi, K., Krishnamurthy, N.V., Hu, W., Lee, J.B. & Gimi, B. (2009). SU-8-based immunoisolative microcontainer with nanoslots defined by nanoimprint lithography. J Vac Sci Technol B 27(6), 2795–2800.Google Scholar
Liu, J., Cai, B., Zhu, J., Ding, G., Zhao, X., Yang, C. & Chen, D. (2004). Process research of high caspect ratio microstructure using SU-8 resist. Microsyst Technol 10(4), 265–268.Google Scholar
Losche, M., Schmitt, J., Decher, G., Bouwman, W.G. & Kjaer, K. (1998). Detailed structure of molecularly thin polyelectrolyte multilayer films on solid substrates as revealed by neutron reflectometry. Macromolecules 31(25), 8893–8906.CrossRefGoogle Scholar
Lua, Y.Y., Yang, L., Pew, C.A., Zhang, F., Fillmore, W.J.J., Bronson, R.T., Sathyapalan, A., Savage, P.B., Whittaker, J.D., Davis, R.C. & Linford, M.R. (2005). Polyelectrolytes as new matrices for secondary ion mass spectrometry. J Am Soc Mass Spectrom 16(10), 1575–1582.Google Scholar
Owen, J.I., Niederhauser, T.L., Wacaser, B.A., Christenson, M.P., Davis, R.C. & Linford, M.R. (2004). Automated, controlled deposition of nanoparticles on polyelectrolyte-coated silicon from chemomechanically patterned droplet arrays. Lab Chip 4(6), 553–557.Google Scholar
Perennes, F., Marmiroli, B., Matteucci, M., Tormen, M., Vaccari, L. & Di Fabrizio, E. (2006). Sharp beveled tip hollow microneedle arrays fabricated by LIGA and 3D soft lithography with polyvinyl alcohol. J Micromech Microeng 16(3), 473–479.Google Scholar
Saini, G., Jensen, D.S., Wiest, L.A., Vail, M.A., Dadson, A., Lee, M.L., Shutthanandan, V. & Linford, M.R. (2010). Core-shell diamond as a support for solid-phase extraction and high-performance liquid chromatography. Anal Chem 82(11), 4448–4456.Google Scholar
Saini, G., Yang, L., Lee, M.L., Dadson, A., Vail, M.A. & Linford, M.R. (2008). Amino-modified diamond as a durable stationary phase for solid-phase extraction. Anal Chem 80(16), 6253–6259.Google Scholar
Sander, K., Gendron, T., Yiannaki, E., Cybulska, K., Kalber, T.L., Lythgoe, M.F. & Årstad, E. (2015). Sulfonium salts as leaving groups for aromatic labelling of drug-like small molecules with fluorine-18. Sci Rep 5, 9941.Google Scholar
Shechter, L., Wynstra, J. & Kurkjy, R.P. (1956). Glycidyl ether reactions with amines. Ind Eng Chem 48(1), 94–97.Google Scholar
Sitti, M. & Fearing, R.S. (2003). Synthetic gecko foot-hair micro/nano-structures as dry adhesives. J Adhes Sci Technol 17(8), 1055–1073.CrossRefGoogle Scholar
Sukhorukov, G.B., Donath, E., Davis, S., Lichtenfeld, H., Caruso, F., Popov, V.I. & Mohwald, H. (1998). Stepwise polyelectrolyte assembly on particle surfaces: A novel approach to colloid design. Polym Adv Technol 9(10–11), 759–767.Google Scholar
Tompkins, H.G. & Irene, E.A. (2005). Handbook of Ellipsometry. Norwich, NY and Heidelberg: William Andrew Publishing; Springer.Google Scholar
Wiest, L.A., Jensen, D.S., Hung, C.H., Olsen, R.E., Davis, R.C., Vail, M.A., Dadson, A.E., Nesterenko, P.N. & Linford, M.R. (2011). Pellicular particles with spherical carbon cores and porous nanodiamond/polymer shells for reversed-phase HPLC. Anal Chem 83(14), 5488–5501.Google Scholar
Willson, C.G. & Trinque, B.C. (2003). The evolution of materials for the photolithographic process. J Photopolym Sci Technol 16(4), 621–627.Google Scholar
Zhang, J., Tan, K., Hong, G., Yang, L. & Gong, H. (2001). Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS. J Micromech Microeng 11(1), 20.Google Scholar