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Outlook of Application of Aberration Corrected-Electron Microscopy in the Ligandprotected Metal Clusters

Published online by Cambridge University Press:  01 August 2004

Huiping Xu ,
Ray D. Twesten ,
Laurent Menard ,
Anatoly Frenkel ,
Ralph Nuzzo ,
Duane Johnson  and
Judith C. Yang
Huiping Xu
Affiliation:
Materials Science and Engineering, University of Pittsburgh, Pittsburgh
Ray D. Twesten
Affiliation:
Center for Microanalysis of Materials, University of Illinois at Urbana-Champaign
Laurent Menard
Affiliation:
Department of Chemistry, University of Illinois at Urbana-Champaign
Anatoly Frenkel
Affiliation:
Department of Physics, Yeshiva University, New York, New York
Ralph Nuzzo
Affiliation:
Department of Chemistry, University of Illinois at Urbana-Champaign
Duane Johnson
Affiliation:
Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign
Judith C. Yang
Affiliation:
Materials Science and Engineering, University of Pittsburgh, Pittsburgh
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Extract

Extended abstract of a paper presented at the Pre-Meeting Congress: Materials Research in an Aberration-Free Environment, at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, July 31 and August 1, 2004.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 10 , Issue S03 , August 2004 , pp. 62 - 63
Copyright
© 2004 Microscopy Society of America

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