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Optimization of the Peak-to-Background Ratio and the Low Energy Response of Silicon Drift Detectors for High Resolution X-ray Spectroscopy

Published online by Cambridge University Press:  31 July 2006

A Niculae ,
H Soltau ,
P Lechner ,
A Liebl ,
G Lutz ,
L Strüder ,
A Longoni ,
R Eckhard ,
G Schaller  and
F Schopper
A Niculae
Affiliation:
PNSensor GmbH Munich, Germany
H Soltau
Affiliation:
PNSensor GmbH Munich, Germany
P Lechner
Affiliation:
PNSensor GmbH Munich, Germany
A Liebl
Affiliation:
PNSensor GmbH Munich, Germany
G Lutz
Affiliation:
Semiconductor Laboratory of Max-Planck-Institute in Munich, Germany
L Strüder
Affiliation:
Semiconductor Laboratory of Max-Planck-Institute in Munich, Germany
A Longoni
Affiliation:
Politecnico di Milano, Italy
R Eckhard
Affiliation:
PNSensor GmbH Munich, Germany
G Schaller
Affiliation:
Semiconductor Laboratory of Max-Planck-Institute in Munich, Germany
F Schopper
Affiliation:
Semiconductor Laboratory of Max-Planck-Institute in Munich, Germany

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Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2006

Type
Abstract
Information
Microscopy and Microanalysis , Volume 12 , Issue S02 , August 2006 , pp. 862 - 863
Copyright
© 2006 Microscopy Society of America