Hostname: page-component-586b7cd67f-dlnhk Total loading time: 0 Render date: 2024-11-26T04:47:48.212Z Has data issue: false hasContentIssue false
  • English
  • Français

Optimization of High Current Xenon Plasma Ion Beams for Applications in Semiconductor Failure Analysis and Development

Published online by Cambridge University Press:  27 August 2014

Srinivas Subramaniam  and
Kevin Johnson
Srinivas Subramaniam
Affiliation:
Intel Corporation, Hillsboro, USA
Kevin Johnson
Affiliation:
Intel Corporation, Hillsboro, USA

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 296 - 297
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Richard, Young, et al, Microsc. Microanal. 17 (Suppl), (2011) 652. [2] Dean Malta et al., IEEE ECTC Proceedings, (2011) 1815.Google Scholar
[3] Giannuzzi, Lucille A.and Smith, Noel S. Microsc. Microanal. 17 (Suppl), (2011) 646.Google Scholar
[4] Volkert, C.A.and Minor, A. M. M.R.S. Bulletin, 32 (2007) 389.Google Scholar