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Novel Cluster Ion Beams For Secondary Ion Generation, Sputtering And FIB/SIMS Application

Published online by Cambridge University Press:  23 November 2012

F. Kollmer
Affiliation:
R&D, ION-TOF GmbH, Muenster, Germany
D. Rading
Affiliation:
R&D, ION-TOF GmbH, Muenster, Germany
R. Moellers
Affiliation:
R&D, ION-TOF GmbH, Muenster, Germany
H. Cramer
Affiliation:
R&D, ION-TOF GmbH, Muenster, Germany
W. Paul
Affiliation:
R&D, ION-TOF GmbH, Muenster, Germany
E. Niehuis
Affiliation:
R&D, ION-TOF GmbH, Muenster, Germany
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Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Copyright
Copyright © Microscopy Society of America 2012

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