Hostname: page-component-586b7cd67f-r5fsc Total loading time: 0 Render date: 2024-11-27T11:33:32.102Z Has data issue: false hasContentIssue false
  • English
  • Français

A modular 100 keV vacuum sealed FEG for high resolution electron microscopy

Published online by Cambridge University Press:  30 July 2021

Mohamed El-Gomati ,
Torquil Wells ,
Xiaoping Zha ,
Richard Sykes ,
Richard Henderson ,
Christopher Russo  and
Greg McMullan
Mohamed El-Gomati
Affiliation:
YPS, United States
Torquil Wells
Affiliation:
YPS, United States
Xiaoping Zha
Affiliation:
YPS, United States
Richard Sykes
Affiliation:
YPS, United States
Richard Henderson
Affiliation:
MRC Laboratory of Molecular Biology, Cambridge, England, United Kingdom
Christopher Russo
Affiliation:
MRC Laboratory of Molecular Biology, United States
Greg McMullan
Affiliation:
MRC Laboratory of Molecular Biology, United States

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Cryo-EM at Local, Regional, and National Cryo-EM Centers
Information
Microscopy and Microanalysis , Volume 27 , Supplement S1 , August 2021 , pp. 846 - 847
Check for updates
Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

References

Peet, M.J., Henderson, R. & Russo, C.J. “The energy dependence of contrast and damage in electron cryomicroscopy of biological molecules” Ultramicroscopy 203, 125–131 (2019).CrossRefGoogle ScholarPubMed
Naydenova, K., McMullan, G., Peet, M.J., Lee, Y., Edwards, P.C., Chen, S., Leahy, E., Scotcher, S., Henderson, R., Russo, C.J. “CryoEM at 100 keV: a demonstration and prospects ” IUCrJ 6, 1086-1098 (2019).CrossRefGoogle ScholarPubMed
Kamp, M., Emmerling, M., Kuhn, S., and Forchel, A. “Nanolithography using a 100 kV electron beam lithography system with a Schottky emitter” J. Vac. Sci. Technol. B 17, 86–89 (1999).CrossRefGoogle Scholar
Egerton, R.F. “Choice of operating voltage for a transmission electron microscope” Ultramicroscopy 145, 85–93 (2014).Google ScholarPubMed