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Microstructure and Electrical Properties of III-As Gate Stacks with Amorphous Rare-Earth High-k Oxides

Published online by Cambridge University Press:  01 August 2010

S Oktyabrsky ,
R Kambhampati ,
V Tokranov ,
M Yakimov ,
T Heeg ,
M Warusawithana ,
DG Schlom  and
S Koveshnikov
S Oktyabrsky
Affiliation:
University at Albany
R Kambhampati
Affiliation:
University at Albany
V Tokranov
Affiliation:
University at Albany
M Yakimov
Affiliation:
University at Albany
T Heeg
Affiliation:
Cornell University
M Warusawithana
Affiliation:
Cornell University
DG Schlom
Affiliation:
Cornell University
S Koveshnikov
Affiliation:
University at Albany

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 1412 - 1413
Copyright
Copyright © Microscopy Society of America 2010