Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-11-26T01:51:13.175Z Has data issue: false hasContentIssue false
  • English
  • Français

Measurement And Simulation Of X-Ray Emission From Multilayered Structures In Electron Probe Microanalysis.

Published online by Cambridge University Press:  02 July 2020

C. Merlet ,
X. Llovet  and
F. Salvat
C. Merlet
Affiliation:
CNRS, Université de Montpellier II, PI. E. Bataillon, 34095, Montpellier, cedex 5, France.
X. Llovet
Affiliation:
Serveis Cientifico-tecnics, Universitat de Barcelona, Diagonal 647, 08028, Barcelona, Spain.
F. Salvat
Affiliation:
Facultat de Fisica (ECM) Universitat de Barcelona, Diagonal 64, 08028, Barcelona, Spain.
Get access

Extract

Studies of x-ray emission from thin films on substrates using an electron probe microanalyzer (EPMA) provide useful information on the characteristics of x-ray generation by electron beams. In this study, EPMA measurements of multilayered samples were performed in order to test and improve analytical and numerical models used for quantitative EPMA. These models provide relatively accurate results for samples consisting of layers with similar average atomic numbers, because of their similar properties regarding electron transport and x-ray generation. On the contrary, these models find difficulties to describe the process when the various layers have very different atomic numbers. In a previous work, we studied the surface ionization of thin copper films of various thicknesses deposited on substrates with very different atomic numbers. In the present communication, the study is extended to the case of multilayered specimens.

The studied specimens consisted of thin copper films deposited on a carbon layer which, in turn, was placed on a variety of single-element substrates, ranging from Be to Bi.

Type
Quantitative X-Ray Microanalysis
Information
Microscopy and Microanalysis , Volume 5 , Issue S2: Proceedings: Microscopy & Microanalysis '99, Microscopy Society of America 57th Annual Meeting, Microbeam Analysis Society 33rd Annual Meeting, Portland, Oregon August 1-5, 1999 , August 1999 , pp. 78 - 79
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Bastin, G.F. and Heijligers, H.J.M., Proc. 28th Mas Meeting, New Orleans, (1994) 43Google Scholar
2.Merlet, C., Proc. of Microbeam Analysis, Edited by Etz, E. S., VCH Publishers, (1995) 203Google Scholar
3.Baro, J. et al., Nucl. Instr. And Meth. B, 100 (1995) 31CrossRefGoogle Scholar
4.Llovet, X., Merlet, C. and Salvat, F., Mikrochimica Acta, [suppl.] 15, (1998), 155Google Scholar