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Materials Applications of Aberration-Corrected STEM

Published online by Cambridge University Press:  01 August 2004

S. J. Pennycook ,
M. F. Chisholm ,
M. Varela ,
A. R. Lupini ,
A. Borisevich ,
Y. Peng ,
K. Van Benthem ,
N. Shibata ,
V. P. Dravid  and
P. Prabhumirashi
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S. J. Pennycook
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee
M. F. Chisholm
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee
M. Varela
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee
A. R. Lupini
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee
A. Borisevich
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee
Y. Peng
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee
K. Van Benthem
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee
N. Shibata
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee University of Tokyo, Japan
V. P. Dravid
Affiliation:
Northwestern University, Evanston, Illinois
P. Prabhumirashi
Affiliation:
Northwestern University, Evanston, Illinois
S. D. Findlay
Affiliation:
University of Melbourne, Victoria, Australia
M. P. Oxley
Affiliation:
University of Melbourne, Victoria, Australia
L. J. Allen
Affiliation:
University of Melbourne, Victoria, Australia
N. Dellby
Affiliation:
Nion Co., Kirkland, Washington
P. D. Nellist
Affiliation:
Nion Co., Kirkland, Washington
Z. S. Szilagyi
Affiliation:
Nion Co., Kirkland, Washington
O. L. Krivanek
Affiliation:
Nion Co., Kirkland, Washington
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Extract

Extended abstract of a paper presented at the Pre-Meeting Congress: Materials Research in an Aberration-Free Environment, at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, July 31 and August 1, 2004.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 10 , Issue S03 , August 2004 , pp. 12 - 13
Copyright
© 2004 Microscopy Society of America

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