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Interfacial Stress: The Importance of Stress Relaxation in TEM Cross-Sections

Published online by Cambridge University Press:  01 August 2004

Jean Luc Rouviere ,
Laurent Clement ,
Roland Pantel  and
Loek F T Kwakman
Jean Luc Rouviere
Affiliation:
CEA-Grenoble, Grenoble, France
Laurent Clement
Affiliation:
CEA-Grenoble, Grenoble, France Philips Semiconductor, Crolles, France
Roland Pantel
Affiliation:
STMicroelectronics, Crolles, France
Loek F T Kwakman
Affiliation:
Philips Semiconductor, Crolles, France
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 10 , Issue S02 , August 2004 , pp. 262 - 263
Copyright
© 2004 Microscopy Society of America

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