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In-situ Low Energy Argon Ion Milling of Nanoelectronic Structures Using a Triple Beam System

Published online by Cambridge University Press:  26 July 2009

H Stegmann ,
Y Ritz ,
D Utess ,
H-J Engelmann  and
E Zschech
H Stegmann
Affiliation:
Carl Zeiss NTS GmbH,Germany
Y Ritz
Affiliation:
AMD LLC & Co ,Germany
D Utess
Affiliation:
AMD LLC & Co ,Germany
H-J Engelmann
Affiliation:
AMD LLC & Co ,Germany
E Zschech
Affiliation:
AMD LLC & Co ,Germany

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009

Type
Abstract
Information
Microscopy and Microanalysis , Volume 15 , Supplement S2 , July 2009 , pp. 170 - 171
Copyright
Copyright © Microscopy Society of America 2009