Hostname: page-component-cd9895bd7-gxg78 Total loading time: 0 Render date: 2024-12-27T04:37:36.735Z Has data issue: false hasContentIssue false
  • English
  • Français

In-situ Electrical Characterization of Nano-Interconnect Structure in FIB

Published online by Cambridge University Press:  01 August 2005

D D Cha ,
Y Ai ,
J Huang ,
T Zheng ,
B Gnade. E  and
M J Kim
D D Cha
Affiliation:
University of Texas Dallas
Y Ai
Affiliation:
University of Texas Dallas
J Huang
Affiliation:
University of Texas Dallas
T Zheng
Affiliation:
University of Texas Dallas
B Gnade. E
Affiliation:
University of Texas Dallas
M J Kim
Affiliation:
University of Texas Dallas

Extract

Core share and HTML view are not available for this content. However, as you have access to this content, a full PDF is available via the ‘Save PDF’ action button.

Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

Type
Research Article
Information
Microscopy and Microanalysis , Volume 11 , Issue S02 , August 2005 , pp. 818 - 819
Copyright
© 2005 Microscopy Society of America