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Influence of Nonlinear Intensity Attenuation in Bright-Field TEM Images on Tomographic Reconstructions of Micron-Scaled Materials

Published online by Cambridge University Press:  23 September 2015

Jun Yamasaki ,
Michihiro Mutoh ,
Shigemasa Ohta ,
Shuichi Yuasa ,
Shigeo Arai ,
Katsuhiro Sasaki  and
Nobuo Tanaka
Jun Yamasaki
Affiliation:
Research Center for Ultra-High Voltage Electron Microscopy, Osaka University, Ibaraki, Osaka, Japan
Michihiro Mutoh
Affiliation:
EcoTopia Science Institute, Nagoya University, Nagoya, Japan
Shigemasa Ohta
Affiliation:
JEOL Ltd., Akishima, Tokyo, Japan
Shuichi Yuasa
Affiliation:
JEOL Ltd., Akishima, Tokyo, Japan
Shigeo Arai
Affiliation:
EcoTopia Science Institute, Nagoya University, Nagoya, Japan
Katsuhiro Sasaki
Affiliation:
Department of Quantum Engineering, Nagoya University, Nagoya, Japan
Nobuo Tanaka
Affiliation:
EcoTopia Science Institute, Nagoya University, Nagoya, Japan

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 993 - 994
Copyright
Copyright © Microscopy Society of America 2015 

References

References:

[1] Motojima, S., etal., Appl. Phys. Lett. 56 (1990). p. 321.Google Scholar
[2] Yamasaki, J., et al., Microscopy 63 (2014). p. 345.CrossRefGoogle Scholar
[3] Tanaka, N., et al., Microscopy 62 (2013). p. 205.Google Scholar