Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-26T14:27:36.792Z Has data issue: false hasContentIssue false
  • English
  • Français

In situ Transmission Electron Microscopy of Copper Electrodeposition

Published online by Cambridge University Press:  01 August 2002

F. M. Ross ,
M. J. Williamson ,
R. M. Tromp ,
R. Hull  and
P. M. Vereecken
F. M. Ross
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
M. J. Williamson
Affiliation:
School of Engineering and Applied Science, University of Virginia, Charlottesville, VA 22903
R. M. Tromp
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
R. Hull
Affiliation:
School of Engineering and Applied Science, University of Virginia, Charlottesville, VA 22903
P. M. Vereecken
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 8 , Issue S02 , August 2002 , pp. 420 - 421
Copyright
Copyright © Microscopy Society of America 2002