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In Situ Biasing of Tapered Si-Ge NW Heterojunctions using Off-Axis ElectronHolography

Published online by Cambridge University Press:  27 August 2014

Z. Gan
Affiliation:
Department of Physics, Arizona State University, Tempe, AZ 85287
D. Perea
Affiliation:
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, WA 99352
Y. He
Affiliation:
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, WA 99352
R. Colby
Affiliation:
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, WA 99352
M. Gu
Affiliation:
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, WA 99352
Y. Jinkyoung
Affiliation:
.Center for Integrated Nanotechnologies, Los Alamos National Laboratory, Los Alamos, NM 87545
C. Wang
Affiliation:
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, WA 99352
S. T. Picraux
Affiliation:
.Center for Integrated Nanotechnologies, Los Alamos National Laboratory, Los Alamos, NM 87545
D. J. Smith
Affiliation:
Department of Physics, Arizona State University, Tempe, AZ 85287
M. R. McCartney
Affiliation:
Department of Physics, Arizona State University, Tempe, AZ 85287

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Ionescu, A. M. and Riel, H. Nature 479 (2011) 329.Google Scholar
[2] McCartney, M. R. and Smith, D. J. Ann. Rev. Mater. Res. 37 (2007) 729.Google Scholar
[3] Gan, Z., et al., Applied Physics Letters, 103 (2013) 153108.Google Scholar
[4] Perea, D., et al., Nano Lett, 11 (2011) 3117.Google Scholar
[5] The electron holography studies have been supported by DoE Grant DE-FG02-04ER46168. We gratefully acknowledge the use of facilities within HREM center at Arizona State University. We also acknowledge use of the CINT and EMSL user facilities.Google Scholar