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Imaging Thin Films of Nanoporous Low-k Dielectrics: Comparison between Ultramicrotomy and Focused Ion Beam Preparations for Transmission Electron Microscopy

Published online by Cambridge University Press:  09 December 2005

Leslie E. Thompson ,
Philip M. Rice ,
Eugene Delenia ,
Victor Y. Lee ,
Phillip J. Brock ,
Teddie P. Magbitang ,
Geraud Dubois ,
Willi Volksen ,
Robert D. Miller  and
Ho-Cheol Kim
Leslie E. Thompson
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099
Philip M. Rice
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099
Eugene Delenia
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099
Victor Y. Lee
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099
Phillip J. Brock
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099
Teddie P. Magbitang
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099
Geraud Dubois
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099
Willi Volksen
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099
Robert D. Miller
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099
Ho-Cheol Kim
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099
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Abstract

Ultramicrotomy, the technique of cutting nanometers-thin slices of material using a diamond knife, was applied to prepare transmission electron microscope (TEM) specimens of nanoporous poly(methylsilsesquioxane) (PMSSQ) thin films. This technique was compared to focused ion beam (FIB) cross-section preparation to address possible artifacts resulting from deformation of nanoporous microstructure during the sample preparation. It was found that ultramicrotomy is a successful TEM specimen preparation method for nanoporous PMSSQ thin films when combined with low-energy ion milling as a final step. A thick, sacrificial carbon coating was identified as a method of reducing defects from the FIB process which included film shrinkage and pore deformation.

Keywords

FIBlow-k materialsnanoporous materialsultramicrotomyTEM
Type
MATERIALS APPLICATIONS
Information
Microscopy and Microanalysis , Volume 12 , Issue 2 , April 2006 , pp. 156 - 159
Copyright
© 2006 Microscopy Society of America

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References

REFERENCES

Connor, E., Sundberg, L., Kim, H.-C., Cornelissen, J.J., Magbitang, T., Rice, P.M., Lee, V.Y., Hawker, C.J., Volksen, W., Hedrick, J.L., & Miller, R.D. (2003). Templating of silsesquioxane cross-linking using unimolecular self-organizing polymers. Angew Chem Int Ed 42, 3785–3788.CrossRefGoogle Scholar
Hedrick, J.L., Miller, R.D., Hawker, C.J., Carter, K.R., Volksen, W., Yoon, D.Y., & Trollsas, M. (1998). Templating nano porosity in thin-films dielectric insulator. Adv Mater 10, 1049–1053.3.0.CO;2-F>CrossRefGoogle Scholar
Ho, P.S., Leu, J., & Lee, W.W. (2003). Low Dielectric Constant Materials for IC Applications. Springer Series in Advanced Microelectronics, Vol. 9, pp. 1–21. Berlin: Springer.
Huang, E., Toney, M.F., Lurio, L.B., Volksen, W., Mecerreyes, D., Brock, P., Kim, H.-C., Hawker, C.J., Hedrick, J.L., Lee, V.Y., Magbitang, T., & Miller, R.D. (2002). Pore size distribution in nanoporous methyl silsesquioxane films as determined by small angle X-ray scattering. Appl Phys Lett 81, 2232–2234.CrossRefGoogle Scholar
Kim, H.-C., Volksen, W., Miller, R.D., Huang, E., Yang, G., Briber, R.M., Shin, K.W., & Satija, S.K. (2003). Neutron reflectivity on nanoporous poly(methyl silsesquioxane) thin films. Chem Mater 15, 609–611.CrossRefGoogle Scholar
Miller, R.D., Volksen, W., Lee, V.Y., Connor, E., Magbitang, T., Zafran, R., Sundberg, L., Hawker, C.J., Hedrick, J.L., Huang, E., Toney, M.F., Huang, Q.R., Frank, C.W., & Kim, H.-C. (2004). Polymers for Micro- and Nano-electronics. In ACS Symposium Series 874, Lin, Q., Pearson, R.A. & Hedrick, J.C. (Eds.), pp. 144–160. American Chemical Society.
Moore, M.V., Rozeveld, S., & Beach, E. (2002, September). Using FIB for TEM analysis of semiconductor materials. Solid State Tech S18–S20.Google Scholar