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High Contact-Resistance from Oxygen in Embedding ILD: An Investigation by TEM PEELS

Published online by Cambridge University Press:  05 August 2007

W Qin ,
A Donovan ,
D Heleotes ,
A Elkin ,
M Vadipour ,
N Lerner ,
P Fejes ,
D Theodore  and
D Theodore
W Qin
Affiliation:
Freescale Semiconductor Inc
A Donovan
Affiliation:
Freescale Semiconductor Inc
D Heleotes
Affiliation:
Freescale Semiconductor Inc
A Elkin
Affiliation:
Freescale Semiconductor Inc
M Vadipour
Affiliation:
Freescale Semiconductor Inc
N Lerner
Affiliation:
Freescale Semiconductor Inc
P Fejes
Affiliation:
Freescale Semiconductor Inc
D Theodore
Affiliation:
Freescale Semiconductor Inc
D Theodore
Affiliation:
Freescale Semiconductor Inc
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2007 in Ft. Lauderdale, Florida, USA, August 5 – August 9, 2007

Type
Research Article
Information
Microscopy and Microanalysis , Volume 13 , Issue S02 , August 2007 , pp. 1134 - 1135
Copyright
© 2007 Microscopy Society of America

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