Hostname: page-component-586b7cd67f-vdxz6 Total loading time: 0 Render date: 2024-11-27T09:55:46.516Z Has data issue: false hasContentIssue false

Excellent Agreement Between High Resolution EBSD and XRD Strain Measurements on Si1-xGex films on Si

Published online by Cambridge University Press:  09 October 2013

M.D. Vaudin
Affiliation:
W.A. Osborn
Affiliation:
L.H. Friedman
Affiliation:
R.F. Cook
Affiliation:

Abstract

Core share and HTML view are not available for this content. However, as you have access to this content, a full PDF is available via the ‘Save PDF’ action button.

Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.

Type
Abstract
Copyright
Copyright © Microscopy Society of America 2013