Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-26T01:48:34.465Z Has data issue: false hasContentIssue false
  • English
  • Français

Electron Holography of CMOS Devices with Epitaxial Layers

Published online by Cambridge University Press:  27 August 2014

M. A. Gribelyuk ,
V. Ontalus ,
T. N. Adam ,
F. H. Baumann  and
P. R. Ronsheim
M. A. Gribelyuk
Affiliation:
IBMSystems and Technology Group, Hopewell Junction, NY 12533, USA
V. Ontalus
Affiliation:
IBMSystems and Technology Group, Hopewell Junction, NY 12533, USA
T. N. Adam
Affiliation:
IBMSystems and Technology Group, Hopewell Junction, NY 12533, USA
F. H. Baumann
Affiliation:
IBMSystems and Technology Group, Hopewell Junction, NY 12533, USA
P. R. Ronsheim
Affiliation:
IBMSystems and Technology Group, Hopewell Junction, NY 12533, USA

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 252 - 253
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Jin, B, Brask, J, Datta, S, Dewey, G, et.al, in Electrochem.Soc. Proc (2004) vol. 2004-07, pp. 111-122.Google Scholar
[2] Yang, B.(Frank), Takalkar, R, Ren, Z, et.al., IEDM Tech.Dig., 51 (2008).Google Scholar
[3] McCartney, M. R Software package for reconstruction in electron holography.Google Scholar
[4] Baumann, F. H F-STRAIN: Software algorithm for extraction of strain from nanobeam diffraction data (to be published).Google Scholar
[5] Authors acknowledge L. Kimball (IBM) for technical help.Google Scholar