Hostname: page-component-78c5997874-s2hrs Total loading time: 0 Render date: 2024-11-09T05:24:00.294Z Has data issue: false hasContentIssue false
  • English
  • Français

Electron Energy-loss Spectroscopy Study on Boron Diffusion in Free Layer of Tunneling Magnetoresistance Thin Films with Ti Capping Layers

Published online by Cambridge University Press:  23 November 2012

L. Chen ,
C. Yang ,
Q. Leng  and
H. Wang
L. Chen
Affiliation:
Western Digital, Fremont, CA
C. Yang
Affiliation:
Western Digital, Fremont, CA
Q. Leng
Affiliation:
Western Digital, Fremont, CA
H. Wang
Affiliation:
Western Digital, Fremont, CA
Get access

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 1850 - 1851
Copyright
Copyright © Microscopy Society of America 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)