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Electron Beam Effects on Silicon Oxide Films – Structure and Electrical Properties

Published online by Cambridge University Press:  01 August 2018

Krishna Kanth Neelisetty ,
Sebastian Gutsch ,
Falk von Seggern ,
Alan Molinari ,
Alexander Vahl ,
Xiaoke Mu ,
Torsten Scherer ,
Chakravadhanula VS Kiran  and
Christian Kübel
Krishna Kanth Neelisetty
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany TU Darmstadt, Darmstadt, Germany
Sebastian Gutsch
Affiliation:
IMTEK Nanotechnologie, Freiburg, Germany
Falk von Seggern
Affiliation:
TU Darmstadt, Darmstadt, Germany
Alan Molinari
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany TU Darmstadt, Darmstadt, Germany
Alexander Vahl
Affiliation:
Technische Fakultät der CAU Kiel, Institut für Materialwissenschaft, Kiel, Germany
Xiaoke Mu
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany
Torsten Scherer
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany
Chakravadhanula VS Kiran
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany Helmholtz Institute Ulm, Karlsruhe Institute of technology, Eggenstein-Leopoldshafen, Germany
Christian Kübel
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany Helmholtz Institute Ulm, Karlsruhe Institute of technology, Eggenstein-Leopoldshafen, Germany Karlsruhe Nano- Micro Facility, Karlsruhe Institute of technology, Eggenstein-Leopoldshafen, Germany

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 1810 - 1811
Copyright
© Microscopy Society of America 2018 

References

[1] Julian Strobel, , et al 245307 2017) p. 1.Google Scholar
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[3] Strobel, J., et al, Appl. Microsc 46 2016) p. 206.Google Scholar
[4] Fawey, M. Hammad, et al, Microsc. Res. Tech. 79 2016) p. 615.Google Scholar
[5] Gutsch, S., et al, Beilstein J. Nanotechnol. 6 2015) p. 964.Google Scholar