Hostname: page-component-586b7cd67f-t8hqh Total loading time: 0 Render date: 2024-11-26T02:35:32.198Z Has data issue: false hasContentIssue false
  • English
  • Français

Effective New Plasma Cleaning Strategies for Scanning Electron Microscopes and FIBs

Published online by Cambridge University Press:  23 September 2015

Ronald Vane  and
Michael Cable
Ronald Vane
Affiliation:
XEI Scientific, Redwood City, CA 94063
Michael Cable
Affiliation:
XEI Scientific, Redwood City, CA 94063

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 161 - 162
Copyright
Copyright © Microscopy Society of America 2015 

References

1. Morgan, C.A. & Vane, R. “Carbon Contamination removal in larger chambers with low-power plasma cleaning” Proceedings of SPIE, vol 8324, 9 March 2012\, pages 83242F-83242F-8, XP055160546, ISSN: 0277-786X, DOI: 10.1117/12.917786.CrossRefGoogle Scholar
2. Vane, Ronald, et al. “Advancements in Decontamination of Vacuum Systems Using Plasma Cleaning” Micrcoscopy and Microanalysis 2104 poster 566.Google Scholar