Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-12-03T20:04:01.988Z Has data issue: false hasContentIssue false
  • English
  • Français

Effect of Oxygen on Sputtered Tantalum Nitride Thin Films for Photoelectrochemical Water Splitting

Published online by Cambridge University Press:  01 August 2018

Sam Macartney ,
Richard Wuhrer  and
Leigh R. Sheppard
Sam Macartney
Affiliation:
School of Computing, Engineering and Mathematics, Western Sydney University, Penrith, Australia
Richard Wuhrer
Affiliation:
Advanced Materials Characterisation Facility, Office of the Deputy Vice-Chancellor & Vice-President (Research & Development), Western Sydney University, Penrith, Australia
Leigh R. Sheppard
Affiliation:
School of Computing, Engineering and Mathematics, Western Sydney University, Penrith, Australia

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 1546 - 1547
Copyright
© Microscopy Society of America 2018 

References

[1] Katsushi, F., Takeshi, K. Kazuhiro, O. Japanese Journal of Applied Physics 44(4L 2005) p. L543.Google Scholar
[2] Fujishima, A. Honda, K. Nature 238(5385 1972) p. 37.Google Scholar
[3] Maeda, K. Domen, K. The Journal of Physical Chemistry Letters 1(18 2010) p. 2655.Google Scholar
[4] Hitoki, G., et al, Chemistry Letters 31(7 2002) p. 736.Google Scholar
[5] Rudolph, M., et al The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water. Surface and Coatings Technology.Google Scholar