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EDX Analysis of Low Concentration Dopant using HD-2700 Aberration Corrected STEM Equipped with Dual SDD

Published online by Cambridge University Press:  23 September 2015

Takahiro Sato ,
Yuya Suzuki ,
Hiroaki Matsumoto ,
Takahito Hashimoto ,
Kuniyasu Nakamura ,
Taiga Miura  and
Hisaharu Yoshida
Takahiro Sato
Affiliation:
.Science Systems Design Div., Hitachi High-Technologies Corporation, 1040 Ichige, Hitachinaka, Ibaraki 312-0033, Japan
Yuya Suzuki
Affiliation:
.Science Systems Design Div., Hitachi High-Technologies Corporation, 1040 Ichige, Hitachinaka, Ibaraki 312-0033, Japan
Hiroaki Matsumoto
Affiliation:
.Science Systems Design Div., Hitachi High-Technologies Corporation, 1040 Ichige, Hitachinaka, Ibaraki 312-0033, Japan
Takahito Hashimoto
Affiliation:
.Science Systems Design Div., Hitachi High-Technologies Corporation, 1040 Ichige, Hitachinaka, Ibaraki 312-0033, Japan
Kuniyasu Nakamura
Affiliation:
.Science Systems Design Div., Hitachi High-Technologies Corporation, 1040 Ichige, Hitachinaka, Ibaraki 312-0033, Japan
Taiga Miura
Affiliation:
.Vacuum Device Inc., 1285-5 Iijima-cho, Mito, Ibaraki 311-4155, Japan
Hisaharu Yoshida
Affiliation:
.Vacuum Device Inc., 1285-5 Iijima-cho, Mito, Ibaraki 311-4155, Japan

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 2013 - 2014
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Hashimoto, T., et al., Microsc. Microanal. 20, 2014, p. 604–605.Google Scholar
[2] Asayama, K., et al., Applied Physics Express 1 (2008) 074001.Google Scholar
[3] Ohnishi, T., et al., Proc. 25th International Symposium for Testing and Failure Analysis, 1999, pp. 449–453.Google Scholar