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Dynamic Monte Carlo Simulation on the Electron-Beam-Induced Deposition of Carbon, Silver, and Tungsten Supertips

Published online by Cambridge University Press:  11 October 2006

Zhi-Quan Liu ,
Kazutaka Mitsuishi  and
Kazuo Furuya
Zhi-Quan Liu
Affiliation:
High Voltage Electron Microscopy Station, National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
Kazutaka Mitsuishi
Affiliation:
High Voltage Electron Microscopy Station, National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
Kazuo Furuya
Affiliation:
High Voltage Electron Microscopy Station, National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
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Abstract

The process of electron-beam-induced deposition (EBID) was simulated with a dynamic Monte Carlo profile simulator, and the growth of carbon, silver, and tungsten supertips was investigated to study the dependence of material composition on the spatial resolution of EBID. Because light atoms have a smaller scattering angle and a longer mean free path, the carbon supertip has the smallest lateral size and the highest aspect ratio of a bottom tip compared to silver and tungsten supertips. Thus the best spatial resolution of EBID can be achieved on materials of low atomic number. The calculation also indicated a significant contribution of primary electrons to the growth of a supertip in EBID, which is consistent with the experimental observations. These results lead to a more comprehensive understanding of EBID, which is a complex interaction process between electrons and solids.

Keywords

Monte Carlo simulationelectron-beam-induced deposition (EBID)fabricationsupertipspatial resolutionelectron scatteringprimary electronsecondary electron
Type
Research Article
Information
Microscopy and Microanalysis , Volume 12 , Issue 6: Special Issue: Frontiers of Electron Microscopy in Materials Science , December 2006 , pp. 549 - 552
Copyright
© 2006 Microscopy Society of America

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References

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