Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-26T09:36:31.311Z Has data issue: false hasContentIssue false
  • English
  • Français

Disconnection-mediated twin junction migration mechanism in FCC metals

Published online by Cambridge University Press:  30 July 2021

Thomas Kaufman ,
Kongtao Chen ,
Jian Han ,
Fan Cao ,
Mingjie Xu ,
Fan Ye ,
David Srolovitz  and
Xiaoqing Pan
Thomas Kaufman
Affiliation:
University of California, Irvine, United States
Kongtao Chen
Affiliation:
University of Pennsylvania, United States
Jian Han
Affiliation:
City University of Hong Kong, United States
Fan Cao
Affiliation:
Wuhan University, United States
Mingjie Xu
Affiliation:
Irvine Materials Research Institute, United States
Fan Ye
Affiliation:
Xi An Jiao Tong University, United States
David Srolovitz
Affiliation:
City University of Hong Kong, United States
Xiaoqing Pan
Affiliation:
Department of Physics and Astronomy, University of California, Irvine, CA 92697, Irvine, California, United States

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Defects in Materials: How We See and Understand Them
Information
Microscopy and Microanalysis , Volume 27 , Supplement S1 , August 2021 , pp. 3100 - 3102
Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

References

Thomas, S.L., et al. , PNAS 116 (2019), 8756–CrossRefGoogle Scholar
Zhu, Q., et al. , Nat. Commun. 10 (2019), 1–8Google Scholar
Thomas, S.L., et al. , Acta Mater. 113 (2016), 301–310CrossRefGoogle Scholar