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Depth Sensitivity of Atomic Resolution Aberration-Corrected Through-Focus STEM Imaging of Bi Dopants on Cu Grain Boundaries

Published online by Cambridge University Press:  23 September 2015

C. A. Wade  and
M. Watanabe
C. A. Wade
Affiliation:
Dept. of Materials Science and Engineering, Lehigh University, Bethlehem, PA
M. Watanabe
Affiliation:
Dept. of Materials Science and Engineering, Lehigh University, Bethlehem, PA

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 2177 - 2178
Copyright
Copyright © Microscopy Society of America 2015 

References

References:

[1] Xin, H.L. & Muller, D.A., J Electron Microsc 58 (2009). p. 157–165.CrossRefGoogle Scholar
[2] Lupini, A.R., etal, Microsc Microanal 15 (2009). p. 441–453.CrossRefGoogle Scholar
[3] The authors acknowledge support NSF through grants DMR-0804528 and DMR-1040229..Google Scholar