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Damage Layers in Si vs. Ion Dose during 30 keV FIB Milling

Published online by Cambridge University Press:  26 July 2009

S Rubanov
S Rubanov*
Affiliation:
University of Melbourne,Australia

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009

Type
Abstract
Information
Microscopy and Microanalysis , Volume 15 , Supplement S2 , July 2009 , pp. 358 - 359
Copyright
Copyright © Microscopy Society of America 2009