Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-27T00:33:29.145Z Has data issue: false hasContentIssue false

Copper Oxidation Via “Ex-Situ” TEM

Published online by Cambridge University Press:  02 July 2020

C.E. Kliewer
Affiliation:
ExxonMobil Research & Engineering, Rt. 22 East, Annandale, NJ08801
M.M. Disko
Affiliation:
ExxonMobil Research & Engineering, Rt. 22 East, Annandale, NJ08801
S.L. Soled
Affiliation:
ExxonMobil Research & Engineering, Rt. 22 East, Annandale, NJ08801
G. DeMartin
Affiliation:
ExxonMobil Research & Engineering, Rt. 22 East, Annandale, NJ08801
J. Baumgartner
Affiliation:
ExxonMobil Research & Engineering, Rt. 22 East, Annandale, NJ08801
S. Miseo
Affiliation:
ExxonMobil Research & Engineering, Rt. 22 East, Annandale, NJ08801
Get access

Extract

The ability to understand and control the microstructure of materials under “real life” conditions is of great interest to both the scientific and industrial communities. In recent years, a variety of “ex-situ” TEM methods have been developed to improve this knowledge base.

ExxonMobil's dedicated reactor system developed for “ex-situ” TEM was used to study the oxidation and reduction of copper on a carbon film and Cu on a Si support. By following the oxidation of specific Cu particles, it was possible to illustrate the oxidation process. A standard, commercially available, 200 mesh Cu grid covered with a holey C support film was used for the Cu on C study. Small Cu islands were vapor deposited from the grid onto the C film during a high temperature reduction in the reactor (Figure 1). The grid was transferred under inert conditions into the TEM where the Cu metal islands were imaged (Figure 2a).

Type
Phase Transformations
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

References:

1.Allard, L.F. et.al., Proc. Micro. & Microanalysis 3 (1997) 595.Google Scholar
2.Kliewer, C.E. et .al., Proc. Micro.&Microanalysis 1 (1999) 926.Google Scholar
3.Dayte, A.K. et. al., “Electron Holography of Heterogeneous Catalysts”, Electron Holography (1995) 199.CrossRefGoogle Scholar