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Concentration at Detection Limit of Dopant for Semiconductor Samples Using Dual SDD Analysis System

Published online by Cambridge University Press:  23 September 2015

K. Fukunaga ,
N. Endo ,
M. Suzuki  and
Y. Kondo
K. Fukunaga
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8551, Japan
N. Endo
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8551, Japan
M. Suzuki
Affiliation:
Thermo Fisher Scientific Japan, 3-9 Moriya-cho, Kanagawa-ku, Yokohama, 221-0022, Japan
Y. Kondo
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8551, Japan

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 823 - 824
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Kawai, S., Ohnishi, I., Ishikawa, T., Yagi, K., Iwama, T., Miyatake, K., Iwasawa, Y., Matsushita, M., Kaneyama, T. & Kondo, Y., Microscopy & Microanalysis 20(S3 (2014). p 1150–1151.CrossRefGoogle Scholar
[2] Ohnishi, I., Kawai, S., Ishikawa, T., Yagi, K., Iwama, T., Miyatake, K., Iwasawa, Y., Matsushita, M., kaneyama, T. & Kondo, Y. Proceedings of IMC18 (Prague 8-12 Sept.) (2014).Google Scholar
[3] This equation is equivalent listed in “Introduction to Analytical Electron Microscopy”. ed J J Hren, J I Goldstein & D C Joy, Prenum Press (Chap.3 1979). p 113. with 3 times standard deviation.Google Scholar