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Comparison of Orientation Mapping in SEM and TEM

Published online by Cambridge University Press:  25 June 2020

Joshua D. Sugar*
Affiliation:
Sandia National Laboratories, Livermore, CA94550, USA
Joseph T. McKeown
Affiliation:
Lawrence Livermore National Laboratory, Livermore, CA94550, USA
Dhego Banga
Affiliation:
Sandia National Laboratories, Livermore, CA94550, USA
Joseph R. Michael
Affiliation:
Sandia National Laboratories, Albuquerque, NM84550, USA
*
*Author for correspondence: Joshua D. Sugar, E-mail: [email protected]
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Abstract

Multiple experimental configurations for performing nanoscale orientation mapping are compared to determine their fidelity to the true microstructure of a sample. Transmission Kikuchi diffraction (TKD) experiments in a scanning electron microscope (SEM) and nanobeam diffraction (NBD) experiments in a transmission electron microscope (TEM) were performed on thin electrodeposited hard Au films with two different microstructures. The Au samples either had a grain size that is >50 or <20 nm. The same regions of the samples were measured with TKD apparatuses at 30 kV in an SEM with detectors in the horizontal and vertical configurations and in the TEM at 300 kV. Under the proper conditions, we demonstrate that all three configurations can produce data of equivalent quality. Each method has strengths and challenges associated with its application and representation of the true microstructure. The conditions needed to obtain high-quality data for each acquisition method and the challenges associated with each are discussed.

Type
Software and Instrumentation
Copyright
Copyright © Microscopy Society of America 2020

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