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Comparative Surface Studies at Atomic Resolution with Ultrahigh Vacuum Variable-Temperature Atomic Force and Scanning Tunneling Microscopes

Published online by Cambridge University Press:  31 July 2002

Masashi Iwatsuki
Affiliation:
Electron Optics Division, JEOL Ltd., Tokyo, Japan
Kazuyuki Suzuki
Affiliation:
Electron Optics Division, JEOL Ltd., Tokyo, Japan
Shin-ich Kitamura
Affiliation:
Electron Optics Division, JEOL Ltd., Tokyo, Japan
Mike Kersker
Affiliation:
JEOL USA, Inc., Peabody, MA
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Abstract

With the ultrahigh vacuum variable-temperature scanning tunneling microscope (UHV-VT-STM), atomic-level observation has been achieved. An ultrahigh vacuum atomic force microscope (UHV-AFM) has also been developed, with success in obtaining atom images where observation in noncontact (NC) mode with a frequency modulation (FM) detection method was attempted. Using the FM detection method in the constant oscillation amplitude of the cantilever excitation mode, we have obtained atomic-resolution images of Si(111) 7 × 7 structures and Si(100) 2 × 1 structures and other structures together with STM images in an ultrahigh vacuum environment. Also shown here are contact potential difference (CPD) images using the NC-AFM method.

Type
Articles
Copyright
© 1999 Microscopy Society of America

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