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Combining Eels and Angle-Resolved Aes to Measure Shallow Profiles of Thin Nitrided Oxide Films on Si

Published online by Cambridge University Press:  01 August 2002

J. Bruley
Affiliation:
IBM Microelectronics Division, Hopewell Junction, NY
H. Wildman
Affiliation:
IBM Microelectronics Division, Hopewell Junction, NY
A. Paterson
Affiliation:
IBM Microelectronics Division, Hopewell Junction, NY

Abstract

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Abstract
Copyright
Copyright © Microscopy Society of America 2002