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Chemical States Analysis of Trace-boron by using an Improved SEM-SXES

Published online by Cambridge University Press:  25 July 2016

M. Terauchi
Affiliation:
IMRAM, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
H. Takahashi
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan
M. Takakura
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan
T. Murano
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan
M. Koike
Affiliation:
QuBS, Japan Atomic Energy Agency, 8-1-7 Umemidai, Kizugawa, Kyoto 619-0215, Japan
T. Imazono
Affiliation:
QuBS, Japan Atomic Energy Agency, 8-1-7 Umemidai, Kizugawa, Kyoto 619-0215, Japan
T. Nagano
Affiliation:
QuBS, Japan Atomic Energy Agency, 8-1-7 Umemidai, Kizugawa, Kyoto 619-0215, Japan
H. Sasai
Affiliation:
Device Department, SHIMADZU Corp., 1 Nishinokyo-Kuwabaracho, Nakagyo-ku, Kyoto 604-8511, Japan
M. Koeda
Affiliation:
Device Department, SHIMADZU Corp., 1 Nishinokyo-Kuwabaracho, Nakagyo-ku, Kyoto 604-8511, Japan

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2016 

References

[1] Takahashi, H, et al., Microscopy and Microanalysis 20(supple. 3 (2014) 684.CrossRefGoogle Scholar
[2] Terauchi, M, et al, Microscopy and Microanalysis 20(supple. 3 (2014) 682.Google Scholar
[3] Terauchi, M, et al., Microscopy and Microanalysis 20 (2014) 629.Google Scholar