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Chemical Analysis with Single Atom Sensitivity Using Aberration-Corrected STEM

Published online by Cambridge University Press:  27 August 2014

Robert F. Klie
Affiliation:
Department of Physics, University of Illinois at Chicago, Chicago, IL 60607, USA
Ahmet Gulec
Affiliation:
Department of Physics, University of Illinois at Chicago, Chicago, IL 60607, USA
JingJing Liu
Affiliation:
Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL 60607, USA
Tadas Paulauskas
Affiliation:
Department of Physics, University of Illinois at Chicago, Chicago, IL 60607, USA
Patrick J. Phillips
Affiliation:
Department of Physics, University of Illinois at Chicago, Chicago, IL 60607, USA
Canhui Wang
Affiliation:
Department of Physics, University of Illinois at Chicago, Chicago, IL 60607, USA
Randall J. Meyer
Affiliation:
Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL 60607, USA

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Zhou, W., Lee, J., Nanda, J., Pantelides, ST., Pennycook, S.J., and Idrobo, J.-C. Atomically localized plasmon enhancement in monolayer graphene. Nature Nanotechnology 2012. 7(3): p. 161-165.Google Scholar
[2] Klie, R. F., Gulec, A., Guo, Z., Paulauskas, T., Qiao, Q., Tao, R., Wang, C., Low, K. B., Nicholls, A. W., and Phillips, P. J. Crystal Research and Technology, 1-12 2013).Google Scholar
[3] Mohammad Asadi, Bijandra Kumar, Behranginia, Amirhossein, Rosen, Brian A., Baskin, Artem, Repnin, Nikita, Pisasale, Davide, Phillips, Patrick, Zhu, Wei, Haasch, Richard, Klie, Robert F., Král, Petr, Abiade, Jeremiah, Khojin, Amin Salehi (submitted).Google Scholar
[4] This work is supported by the US Department of Energy (DE-EE-0005956) and the National Science Foundation (DMR-0959470, DMR-0846748, CBET-1067020).Google Scholar