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Characterization of Defect Formation during Ni Silicidation for CMOS Device Application

Published online by Cambridge University Press:  01 August 2005

K-S Ko ,
S Crank ,
P Chen ,
D Yue ,
S Lavangkul ,
H Mogul ,
S Siddiqui  and
T Bonifield
K-S Ko
Affiliation:
Texas Instruments
S Crank
Affiliation:
Texas Instruments
P Chen
Affiliation:
Texas Instruments
D Yue
Affiliation:
Texas Instruments
S Lavangkul
Affiliation:
Texas Instruments
H Mogul
Affiliation:
Texas Instruments
S Siddiqui
Affiliation:
Texas Instruments
T Bonifield
Affiliation:
Texas Instruments

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

Type
Research Article
Information
Microscopy and Microanalysis , Volume 11 , Issue S02 , August 2005 , pp. 2096 - 2097
Copyright
© 2005 Microscopy Society of America