Characterization of 3D Dopant Distribution in State of the Art FinFET Structures

M.S. Hatzistergos; M. Hopstaken; E. Kim; L. Vanamurthy; J.F. Shaffer

doi:10.1017/S143192761300679X

Characterization of 3D Dopant Distribution in State of the Art FinFET Structures

Published online by Cambridge University Press: 09 October 2013

M.S. Hatzistergos ,

M. Hopstaken ,

E. Kim ,

L. Vanamurthy and

J.F. Shaffer

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M.S. Hatzistergos: Affiliation:
M. Hopstaken: Affiliation:
E. Kim: Affiliation:
L. Vanamurthy: Affiliation:
J.F. Shaffer: Affiliation:

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Abstract

Abstract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.

Type: Abstract
Information: Microscopy and Microanalysis , Volume 19 , Issue S2: Proceedings of Microscopy & Microanalysis 2013 , August 2013 , pp. 960 - 961

DOI: https://doi.org/10.1017/S143192761300679X [Opens in a new window]

Article contents

Characterization of 3D Dopant Distribution in State of the Art FinFET Structures

Abstract

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