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Building and Imaging Silicide Nanostructures in Nanowires

Published online by Cambridge University Press:  23 September 2015

Y.-C. Chou
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY, USA Department of Electrophysics, National Chiao Tung University, 1001 University Road, Hsinchu city, Taiwan. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY, USA.
M. C. Reuter
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY, USA
D. Zakharov
Affiliation:
Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY, USA.
E. A. Stach
Affiliation:
Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY, USA.
E. Jensen
Affiliation:
DTU-Nanotech, Department of Nano- and Microtechnology, Technical University of Denmark, Kgs. Lyngby, Denmark.
K. Mtolhave
Affiliation:
DTU-Nanotech, Department of Nano- and Microtechnology, Technical University of Denmark, Kgs. Lyngby, Denmark.
S. Hofmann
Affiliation:
Department of Engineering, University of Cambridge, 9 J. J. Thomson Avenue, Cambridge, UK.
F. M. Ross
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY, USA

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Ross, F. M., Reports on Progress in Physics 73 (2010), p 114501.Google Scholar
[2] Kallesoe, C., et al., Nano Lett 12 (2012), p 2965.Google Scholar
[3] Chou, Y.-C., et al., in preparation (2015).Google Scholar
[4] We acknowledge the National Science Foundation (Grants No. DMR-0606395 and 0907483), ERC Grant 279342: InSituNANO, the National Science Council of Taiwan (Grant NSC-101-2112-M-009-021-MY3), the Center for Interdisciplinary Science (MOE-ATU project for NCTU) and the Center for Functional Nanomaterials, Brookhaven National Laboratory, which is supported by the U.S. Department of Energy, Office of Basic Energy Sciences, under contract DE-AC02-98CH10886; C. Czarnik for assistance with image processing and A. W. Ellis for technical support..Google Scholar