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Automatic and Quantitative Measurement of Spectrometer Aberrations in Monochromated EELS

Published online by Cambridge University Press:  22 July 2022

Yueming Guo
Affiliation:
Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN, USA
Andrew R. Lupini
Affiliation:
Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, TN, USA

Abstract

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Type
Artificial Intelligence, Instrument Automation, And High-dimensional Data Analytics for Microscopy and Microanalysis
Copyright
Copyright © Microscopy Society of America 2022

References

Krivanek, O. L. et al. Progress in ultrahigh energy resolution EELS. Ultramicroscopy 203, 60-67, (2019).CrossRefGoogle ScholarPubMed
Kahl, F. et al. Test and characterization of a new post-column imaging energy filter, in Advances in Imaging and Electron Physics, vol. 212, Elsevier Inc. (2019)Google Scholar
Twesten, et al. Advances in EELS Instrumentation: A New Design High-Vacuum Parallel EELS System. Microsc. Microanal. 17 (Suppl 2), 2011.CrossRefGoogle Scholar
Work supported by the U.S. Department of Energy, Office of Science, Basic Energy Sciences, Division of Materials Science and Engineering, and was performed at the Oak Ridge National Laboratory's Center for Nanophase Materials Sciences (CNMS), a U.S. Department of Energy Office of Science User Facility. This manuscript has been authored by UT-Battelle, LLC, under Contract No. DE-AC0500OR22725 with the U.S. Department of Energy. The United States Government retains and the publisher, by accepting the article for publication, acknowledges that the United States Government retains a non-exclusive, paid-up, irrevocable, world-wide license to publish or reproduce the published form of this manuscript, or allow others to do so, for the United States Government purposes. The Department of Energy will provide public access to these results of federally sponsored research in accordance with the DOE Public Access Plan (http://energy.gov/downloads/doe-public-access-plan).Google Scholar