Hostname: page-component-586b7cd67f-2brh9 Total loading time: 0 Render date: 2024-11-26T01:56:57.834Z Has data issue: false hasContentIssue false
  • English
  • Français

Atom Probe Field Ion Microscopy of High Resistivity Materials

Published online by Cambridge University Press:  02 July 2020

S. J. Sijbrandij ,
D. J. Larson  and
M. K. Miller
M. K. Miller
Affiliation:
Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831-6376, USA
Get access

Extract

Over the last 30 years, the atom probe has proved to be a powerful tool for studying nanometer-sized compositional fluctuations in a wide range of metallic alloys but has had only limited applications to semiconductors and ceramics. One of the primary reasons for this difference is the higher resistivity of semiconducting and ceramic specimens. Because of this high resistivity, the high voltage field evaporation pulse is attenuated before it reaches the apex of the specimen thereby making the pulse ineffective for field evaporation. Experiments have demonstrated that both variants of the voltagepulsed atom probe (i.e., those instruments in which the field evaporation pulse is applied directly to the specimen and those in which the negative pulse is applied to a counter electrode in front of the specimen) are equally affected. In this overview, the limits of applicability of the voltage-pulsed atom probe to high resistivity materials are examined.

Type
Imaging and Analysis at the Atomic Level: 30 Years of Atom Probe Field Ion Microscopy
Information
Microscopy and Microanalysis , Volume 4 , Issue S2: Proceedings: Microscopy & Microanalysis '98, Microscopy Society of America 56th Annual Meeting, Microbeam Analysis Society 32nd Annual Meeting, Atlanta, Georgia July 12-16, 1998 , July 1998 , pp. 90 - 91
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Miller, M. K. et al., Atom Probe Field Ion Microscopy, Oxford, Oxford University Press (1996).Google Scholar

2. Melmed, A. J., et al., Appl. Phvs. Lett. 39 (1981) 416.CrossRefGoogle Scholar

3. This research was sponsored by the Division of Materials Sciences, U.S. Department of Energy, under contract DE-AC05-960R22464 with Lockheed Martin Energy Research Corp. and by an appointment to the ORNL Postdoctoral Research Associates Program administered jointly by the Oak Ridge Institute for Science and Education and ORNL. This research was conducted utilizing the Shared Research Equipment (SHaRE) User Program facilities at ORNL.Google Scholar