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Artifact-Free Imaging of Photolithographic Masks by Environmental Scanning Electron Microscopy

Published online by Cambridge University Press:  01 August 2005

M Toth ,
B L Thiel ,
M A Coy ,
J G Marshman  and
W R Knowles
M Toth
Affiliation:
FEI Company, Peabody, Massachusetts
B L Thiel
Affiliation:
University at Albany, New York
M A Coy
Affiliation:
FEI Company, Peabody, Massachusetts
J G Marshman
Affiliation:
FEI Company, Peabody, Massachusetts
W R Knowles
Affiliation:
FEI Company, Peabody, Massachusetts

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

Type
Research Article
Information
Microscopy and Microanalysis , Volume 11 , Issue S02 , August 2005 , pp. 390 - 391
Copyright
© 2005 Microscopy Society of America