One of the pillars of Nanotechnology is the possibility of matter manipulation on nanometer scale. At the basis of such pillar, the importance of Scanning Probe Microscopy (SPM) is twofold: surface visualization and material manipulation at a sub-molecular level. There is a myriad of reports in the literature showing astonishing cases of high resolution imaging and manipulation carried out by different SPM techniques [1]. Within such examples, anodic oxidation nanolithography (AON) appears as one of the most promising tools due to its simplicity and applicability to a large variety of materials [1,2]. Therefore, this work reports on a detailed study of possibilities and limitations of AON towards the fabrication of semiconductor- and/or metal-based devices.